Laser Anneling
Laser annealing delivers energy precisely to a thin surface layer for a very short time, so the material can be crystallized, activated or modified without heating the whole substrate. Compared with conventional furnace or rapid thermal annealing, the laser confines the thermal effect to the surface. This protects temperature-sensitive structures, glass or polymer substrates, and devices already built on the backside of the wafer.
SuperbIN offers laser annealing solutions built around line beam and homogenizer optics from INNOVAVENT. Their long, highly uniform line beams can be used with solid-state lasers from IR to UV, and support both process development and high-throughput production. Our application lab and engineering team help customers evaluate process windows and integrate the optics into production systems.
Key Features
Localized, surface-confined heating with minimal thermal impact on the substrate
Uniform line beam and homogenized beam profiles for large-area processing
Compatible with glass, polymer and semiconductor substrates
Scalable from R&D to high-throughput mass production
Process feasibility testing and system integration support
Applications