Photoresists & Functional Materials

The NanoScribe IPX Series materials are advanced photoresists and functional materials optimized for ultra-high-resolution microfabrication using Two-Photon Polymerization (2PP) technology. Designed for precision optical, photonic, and micro-mechanical applications, the material platform enables fabrication of highly complex 3D microstructures with excellent structural accuracy and surface quality.

The IPX material portfolio supports demanding applications requiring optical performance, fine feature definition, mechanical stability, and nanoscale fabrication precision.

Key Features

• Ultra-high-resolution photoresists
• Optimized for Two-Photon Polymerization (2PP)
• Excellent structural precision and surface quality
• High optical transparency
• Suitable for complex freeform microstructures
• Functional materials for photonics and microdevices
• Stable and repeatable fabrication performance

Applications

• Micro-optics and freeform optics
• Silicon photonics
• Photonic packaging
• MEMS and micro-mechanics
• Diffractive optical elements (DOE)
• Waveguides and optical coupling structures
• Metamaterials and photonic crystals
• Semiconductor advanced packaging
• Precision research and industrial microfabrication