Photoresists & Functional Materials
The Nanoscribe IPX Series materials are advanced photoresists and functional materials optimized for ultra-high-resolution microfabrication using Two-Photon Polymerization (2PP) technology. Designed for precision optical, photonic, and micro-mechanical applications, the material platform enables fabrication of highly complex 3D microstructures with excellent structural accuracy and surface quality.
The IPX material portfolio supports demanding applications requiring optical performance, fine feature definition, mechanical stability, and nanoscale fabrication precision.
Key Features
Ultra-high-resolution photoresists
Optimized for Two-Photon Polymerization (2PP)
Excellent structural precision and surface quality
High optical transparency
Suitable for complex freeform microstructures
Functional materials for photonics and microdevices
Stable and repeatable fabrication performance
Applications
Micro-optics and freeform optics
Silicon photonics
Photonic packaging
MEMS and micro-mechanics
Diffractive optical elements (DOE)
Waveguides and optical coupling structures
Metamaterials and photonic crystals
Semiconductor advanced packaging
Precision research and industrial microfabrication
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